How to Fabricate a Transistor: Techniques and Processes

What are the main techniques used in transistor fabrication?

1. Diffusion

2. Ion implantation

3. Epitaxial growth

Main Techniques in Transistor Fabrication

The main techniques used in transistor fabrication are diffusion, ion implantation, and epitaxial growth. These techniques are crucial in creating the desired regions with specific electrical properties in the semiconductor material.

Transistor fabrication involves a complex process that requires the use of various techniques and processes to create the transistor structure. The main techniques used are diffusion, ion implantation, and epitaxial growth.

1. Diffusion: This technique involves diffusing impurities into the semiconductor material to create specific regions with desired electrical properties. The impurities help in altering the conductivity of the material.

2. Ion Implantation: Ion implantation is a process where ions are bombarded onto the semiconductor material to introduce dopants. This helps in modifying the conductivity of the material in a controlled manner.

3. Epitaxial Growth: In epitaxial growth, a thin layer of semiconductor material is deposited onto a substrate. This layer helps in creating the necessary structures for the transistor.